- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/62 - Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Patent holdings for IPC class G03F 1/62
Total number of patents in this class: 531
10-year publication summary
23
|
45
|
51
|
49
|
42
|
66
|
47
|
45
|
65
|
17
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 6816 |
134 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
65 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
48 |
Mitsui Chemicals, Inc. | 3134 |
44 |
Samsung Electronics Co., Ltd. | 131630 |
37 |
ASML Holding N.V. | 542 |
14 |
Fine Semitech Corp. | 22 |
13 |
IMEC VZW | 1410 |
9 |
Research & Business Foundation Sungkyunkwan University | 1640 |
8 |
Carl Zeiss SMT GmbH | 2646 |
7 |
IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) | 1115 |
7 |
International Business Machines Corporation | 60644 |
6 |
Applied Materials, Inc. | 16587 |
6 |
NGK Insulators, Ltd. | 4589 |
6 |
Air Water Inc. | 135 |
6 |
Kaneka Corporation | 4445 |
5 |
Photronics, Inc. | 47 |
5 |
National Institute of Advanced Industrial Science and Technology | 3677 |
4 |
Asahi Kasei E-materials Corporation | 222 |
4 |
Industry-University Cooperation Foundation Hanyang University | 1001 |
4 |
Other owners | 99 |